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Description
| GROWTH METHOD | Metallurgical graphene growth on liquid metal |
| STANDARD SUBSTRATES | PMMA, Si/SiO2, quartz |
| TRANSFER AVAILABILITY | Transfer on custom substrates available upon request |
| QUALITY CONTROL | Raman spectroscopy Optical microscopy SEM microscopy |
| FORM | Graphene film |
| SINGLE GRAIN SIZE | Up to 1 mm |
| COVERAGE* | >95% |
| OPTICAL TRANSMITTANCE* | >97% |
| THICKNESS (THEORETICAL) | 0.345 nm |
| AVERAGE SHEET RESISTANCE* | <250 Ω/cm2 (measured with van der Pauw method) |
*values confirmed by EIT+ Wroclaw Research Centre independent product evaluation study
TRANSMISSION MICROSCOPY
SCANNING ELECTRON MICROSCOPY
(graphene single grain in the nucleation process)
RAMAN SPECTROSCOPY
Substrate parameters
A thin layer of polymethyl methacrylate (PMMA) with a thickness of approx. 6 μm.
CERTIFICATES
HSMG® and AGP’s laboratories have been awarded Nano SoP certification by Tüv-Süd. Graphene evaluation was conducted independently by EIT+ Wroclaw Research Centre.
PATENTS
AGP has patented the method of producing and processing graphene from liquid metal matrix in Poland (PL 224409 B1 and PL 224447 B1), the United States (US 9,284,640 B2) and the European Union (EP 2865646 A1).
